Study on Oxidation Performance of Graphene Oxide Structures by optimization of KMnO4


Sargın F., Ak Azem N. F., Kanbur K., Birlik I., Türk A.

Al-Farabi 4th International Congress on Applied Sciences , Erzurum, Turkey, 19 - 21 August 2022, pp.147-153

  • Publication Type: Conference Paper / Full Text
  • City: Erzurum
  • Country: Turkey
  • Page Numbers: pp.147-153
  • Dokuz Eylül University Affiliated: Yes

Abstract

Graphene oxide (GO) is a single layer nanomaterial that consists of carbon (C) atoms arranged in honeycomb structure with various oxygen and hydrogen containing functional groups attached to them. GO nanomaterials has numerious application areas such as batteries, sensors, biomaterials, photocatalysts and optic devices. Those wide ranges of applications originate from GO’s unique property, which is tunable by adjusting oxidation degree. It is possible to adjust the oxidation degree of GO products by evaluating process parameters. Although GO can be produced by various methods, Hummers method favoured among researchers because of advantages such as; ease of application, high yield, controllable process parameters and short production time. The Hummers method in producing GO from graphite mainly consists of oxidation and exfoliation steps. This method consists of several production steps such as, mixing graphite with acids, introducing oxidizing agents to mixture, adding distilled water and hydrogen peroxide to the solution, washing and filtration of slurry, sonication, and drying procedures. Amog these prosess steps, introducing oxidizing agents such as KMnO4 to graphite-acid mixture effects the oxidation degree of resulted GO products. Thus, it is essential to determine the amount of KMnO4 used in GO production by Hummers method. In this study, effect of oxidizing agent amount on oxidation degree of GO nanomaterials was investigated. In this context, different amounts of KMnO4 were used as an oxidizing agent in the production of GO structures by Hummers method. Afterwards, structural chracterizations were performed by X-Ray diffraction method (XRD) to evaluate the phase strucure, degree of oxidation and interlayer distances between produced GO layers. Fouriertransform infrared spectroscopy (FTIR) was used for confirming the functional groups in GO structure and estimation of the amounts of these functional groups. Ultraviole -visible spectrophotometer (UV-Vis) was utilized to obtain the absorption spectra of GO samples. Results showed that the amount of KMnO4 used in the production process had a significant impact on the degree of oxidation of GO structures.

Graphene oxide (GO) is a single layer nanomaterial that consists of carbon (C) atoms arranged in honeycomb structure with various oxygen and hydrogen containing functional groups attached to them. GO nanomaterials has numerious application areas such as batteries, sensors, biomaterials, photocatalysts and optic devices. Those wide ranges of applications originate from GO’s unique property, which is tunable by adjusting oxidation degree. It is possible to adjust the oxidation degree of GO products by evaluating process parameters. Although GO can be produced by various methods, Hummers method favoured among researchers because of advantages such as; ease of application, high yield, controllable process parameters and short production time. The Hummers method in producing GO from graphite mainly consists of oxidation and exfoliation steps. This method consists of several production steps such as, mixing graphite with acids, introducing oxidizing agents to mixture, adding distilled water and hydrogen peroxide to the solution, washing and filtration of slurry, sonication, and drying procedures. Amog these prosess steps, introducing oxidizing agents such as KMnO4 to graphite-acid mixture effects the oxidation degree of resulted GO products. Thus, it is essential to determine the amount of KMnO4 used in GO production by Hummers method. In this study, effect of oxidizing agent amount on oxidation degree of GO nanomaterials was investigated. In this context, different amounts of KMnO4 were used as an oxidizing agent in the production of GO structures by Hummers method. Afterwards, structural chracterizations were performed by X-Ray diffraction method (XRD) to evaluate the phase strucure, degree of oxidation and interlayer distances between produced GO layers. Fouriertransform infrared spectroscopy (FTIR) was used for confirming the functional groups in GO structure and estimation of the amounts of these functional groups. Ultraviole -visible spectrophotometer (UV-Vis) was utilized to obtain the absorption spectra of GO samples. Results showed that the amount of KMnO4 used in the production process had a significant impact on the degree of oxidation of GO structures.