Effect of Plasma Treatment on the Sensor Properties of a Light-Addressable Potentiometric Sensor (LAPS)


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Oezsoylu D., KIZILDAĞ S., Schoening M. J., Wagner T.

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, vol.216, no.20, 2019 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 216 Issue: 20
  • Publication Date: 2019
  • Doi Number: 10.1002/pssa.201900259
  • Journal Name: PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Keywords: hydrophobic recovery, light-addressable potentiometric sensors (LAPS), plasma treatment, wettability, SURFACE WETTABILITY, SILICON
  • Dokuz Eylül University Affiliated: Yes

Abstract

A light-addressable potentiometric sensor (LAPS) is a field-effect-based (bio-) chemical sensor, in which a desired sensing area on the sensor surface can be defined by illumination. Light addressability can be used to visualize the concentration and spatial distribution of the target molecules, e.g., H+ ions. This unique feature has great potential for the label-free imaging of the metabolic activity of living organisms. The cultivation of those organisms needs specially tailored surface properties of the sensor. O-2 plasma treatment is an attractive and promising tool for rapid surface engineering. However, the potential impacts of the technique are carefully investigated for the sensors that suffer from plasma-induced damage. Herein, a LAPS with a Ta2O5 pH-sensitive surface is successfully patterned by plasma treatment, and its effects are investigated by contact angle and scanning LAPS measurements. The plasma duration of 30 s (30 W) is found to be the threshold value, where excessive wettability begins. Furthermore, this treatment approach causes moderate plasma-induced damage, which can be reduced by thermal annealing (10 min at 300 degrees C). These findings provide a useful guideline to support future studies, where the LAPS surface is desired to be more hydrophilic by O-2 plasma treatment.