Effect of Alkaline Surface Texturing on the Optical, Morphological, and Wettability Properties of Si Wafers
7th International Eurasian Conference on Science, Engineering and Technology (EurasianSciEnTech 2026), Ankara, Türkiye, 24 Haziran - 26 Temmuz 2026, ss.33, (Özet Bildiri)
- Yayın Türü: Bildiri / Özet Bildiri
- Basıldığı Şehir: Ankara
- Basıldığı Ülke: Türkiye
- Sayfa Sayıları: ss.33
- Dokuz Eylül Üniversitesi Adresli: Evet
Özet
Surface texturing is an effective strategy for improving the performance of Si-based optoelectronic devices by
reducing optical reflection losses and increasing the effective surface area. In this study, square-based
pyramidal structures were formed on Si wafer surfaces by NaOH-based alkaline texturing. The morphological
and optical characteristics of the textured surfaces were examined by scanning electron microscopy (SEM)
and ultraviolet-visible (UV-Vis) spectroscopy, while wettability behavior was evaluated by contact angle
testing. The maximum reflectance of the untreated surface was approximately 56%, which decreased to about
34% after 20 min of texturing. However, extending the texturing duration to 40 and 60 min led to overgrown
and irregular surface features, as confirmed by SEM, due to pyramid sharpening and coalescence, resulting in
reduced surface homogeneity. Considering both the decrease in optical reflection and the preservation of
morphological uniformity, 20 min was determined to be the optimum texturing duration. In addition, the
pyramidal textured surface exhibited higher wettability than the non-textured Si surface. These findings
demonstrate that controlled alkaline surface texturing provides an effective route for tailoring the optical and
surface properties of Si wafers.